掃描探針顯微鏡漂移的定量測量方法.pdf

陳宇航 黃文浩
中國科學(xué)技術(shù)大學(xué)精密機(jī)械與精密儀器系,安徽合肥230026
摘　要:對掃描探針顯微鏡（SPM）儀器漂移的定量測量的幾種方法進(jìn)行探討，提出應(yīng)用二維零位標(biāo)記進(jìn)行漂移測量．分析比較使用普通樣品、周期二維光柵、二維零位標(biāo)記和原子光柵在測定儀器漂移中的優(yōu)缺點(diǎn)．結(jié)果表明：應(yīng)用二維零位標(biāo)記的測量技術(shù)對探針與樣品形貌耦合引起的圖像誤差不敏感，漂移測量范圍不受光柵單元尺寸影響．該方法優(yōu)于采用普通樣品和規(guī)則周期的二維光柵樣品的方法，而應(yīng)用原子光柵可以預(yù)計達(dá)到亞原子量級的超高精度的SPM漂移測量．[著者文摘]


Methods for quantitative measurement of drift in scanning probe microscopyCHEN Yu-hang, HUANG Wen-hao Department of Precision Machinery and I , University of Science and Technology of China ,Hefei 230026,ChinaAbstract:Several quantitative drift measurement techniques for scanning probe microscopy （SPM） were introduced. A new method using two-dimensional zero-reference masks was proposed to measure the SPM drift. Four techniques used in drift measurement were compared. They were based on imaging normal sample, periodical regular pattern, zero-reference mask and atomic grating respectively. Results showe that when using zero-reference grating it is not sensitive to tip-induced artifacts in images and the measuring range is not affected by the width of grating element. Thus, this method is superior to the one based on imaging normal samples or regular patterns, while using atomic grating could be expected to obtain sub-atomic resolution for drift measurement.[著者文摘]

Key words:nanometrology; scanning probe microscopy; drift